+ Site Statistics
+ Search Articles
+ PDF Full Text Service
How our service works
Request PDF Full Text
+ Follow Us
Follow on Facebook
Follow on Twitter
Follow on LinkedIn
+ Subscribe to Site Feeds
Most Shared
PDF Full Text
+ Translate
+ Recently Requested

Effect of the working gas of the ion-assisted source on the optical and mechanical properties of SiO2 films deposited by dual ion beam sputtering with Si and SiO2 as the starting materials



Effect of the working gas of the ion-assisted source on the optical and mechanical properties of SiO2 films deposited by dual ion beam sputtering with Si and SiO2 as the starting materials



Applied Optics 45(15): 3510-3515



Silicon and fused-silica targets are used as the starting materials for depositing silicon oxide (SiO2) films. The SiO2 films are prepared by a dual ion beam sputtering deposition system with a main ion source and an ion-assisted source with different working gases. The films deposited are then examined and compared by using a visible spectrophotometer, a Fourier-transform IR spectrophotometer, an atomic force microscope, and contact angle instruments. A Twyman-Green interferometer is employed to study the film stress by phase-shift interferometry. All the SiO2 films show excellent optical properties with extra-low extinction coefficients (below 2x10(-5)) and have no water absorption. When the working gas is O2 for the ion-assisted source, the deposited SiO2 films show good properties in terms of stress and roughness and with a good molecular bonding structure order for both targets. However, SiO2 films deposited from the fused-silica target had a larger contact angle, while those deposited from the silicon target had 2.5 times the deposition rate.

Please choose payment method:






(PDF emailed within 0-6 h: $19.90)

Accession: 048893268

Download citation: RISBibTeXText

PMID: 16708096

DOI: 10.1364/ao.45.003510


Related references

Mechanical and thermoelastic characteristics of optical thin films deposited by dual ion beam sputtering. Applied Optics 48(23): 4536-4544, 2009

Mechanical properties of BCN films deposited by dual cesium ion beam sputtering system. Surface and Coatings Technology 169-170: 340-343, 2003

Properties of SiO2 and Al2O3 films for electrical insulation applications deposited by reactive pulse magnetron sputtering. Surface and Coatings Technology 174-175: 774-778, 2003

Properties of TiO2 and SiO2 thin films deposited using ion assisted deposition. Applied Optics 24(4): 486, 1985

Optical properties investigation of [nc-Si:SiO2/SiO2]30periodic multilayer films. Applied Physics A 109(3): 547-551, 2012

Effect of annealing temperatures on the morphology, optical and electrical properties of TiO2thin films synthesized by the solgel method and deposited on Al/TiO2/SiO2/p-Si. Microsystem Technologies 22(4): 871-881, 2016

Optical and interfacial layer properties of SiO2 films deposited on different substrates. Applied Optics 53(4): A83-A87, 2014

Effect of rapid thermal annealing on Si rich SiO2 films prepared using atom beam sputtering technique. Surface and Coatings Technology 203(17-18): 2506-2509, 2009

Comparison of structure and mechanical properties of SiO2-like films deposited in O2/HMDSO pulsed and continuous plasmas. Surface and Coatings Technology 200(22-23): 6517-6521, 2006

Effect of thermal annealing on the optical properties and residual stress of graded-index-like films deposited by radio-frequency ion-beam sputtering. Applied Optics 50(9): C62-C68, 2011

Optical properties of electrochemically deposited ZnO thin films on colloidal crystal film of SiO2 microspheres. Journal of Nanoscience and Nanotechnology 12(2): 1713-1716, 2012

Stimulated emission characteristics of ZnO thin films deposited by magnetron sputtering on SiO2 substrates. Guang Pu Xue Yu Guang Pu Fen Xi 24(7): 775-778, 2004

Study of structural and optical properties of zirconium carbide (ZrC) thin-films deposited by ion beam sputtering for soft x-ray optical applications. Surface and Coatings Technology 272: 409-414, 2015

Structural, ferroelectric and optical properties of Bi2VO5.5thin films deposited on platinized silicon {(100) Pt/TiO2/SiO2/Si} substrates. Applied Physics A: Materials Science & Processing 91(4): 693-699, 2008

Internal stress and optical properties of Nb2O5 thin films deposited by ion-beam sputtering. Applied Optics 41(10): 2043-2047, 2002