+ Site Statistics
+ Search Articles
+ PDF Full Text Service
How our service works
Request PDF Full Text
+ Follow Us
Follow on Facebook
Follow on Twitter
Follow on LinkedIn
+ Subscribe to Site Feeds
Most Shared
PDF Full Text
+ Translate
+ Recently Requested

An all low-temperature fabrication of macroporous, electrochemically addressable anatase thin films



An all low-temperature fabrication of macroporous, electrochemically addressable anatase thin films



Small 10(8): 1566



Macroporous TiO₂ (anatase) thin films are fabricated by an all low-temperature process in which substrates are dip-coated in suspensions of mixed anatase nanoparticles and polystyrene beads, and the templating agents are removed by ultraviolet (UV) irradiation at a temperature below 50 °C. Scanning electron microscopy (SEM) and Raman spectroscopy show that the templating polymer beads are removed by UV irradiation combined with the photocatalytic activity of TiO₂. X-Ray diffraction reveals that nanoparticle growth is negligible in UV irradiated films, while nanoparticle size increases by almost 10 times in calcined films that are prepared for comparison. The macroporous films are prepared on FTO-(fluorine-doped tin oxide) coated glass and ITO (indium tin oxide) coated flexible plastics and thereby used as working electrodes. In both cases, the films are electrochemically addressable, and cyclic voltammetry is consistent with the response of bulk TiO₂ for calcined films and of nanoscale-TiO₂ for UV-irradiated films.

Please choose payment method:






(PDF emailed within 0-6 h: $19.90)

Accession: 051470559

Download citation: RISBibTeXText

PMID: 24644269

DOI: 10.1002/smll.201300970


Related references

In situ fabrication of electrochemically grown mesoporous metallic thin films by anodic dissolution in deep eutectic solvents. Journal of Colloid and Interface Science 426: 270-279, 2014

Low-temperature preparation of anatase thin films on tantalum. Langmuir 22(15): 6570-6577, 2006

Cationic-vacancy-induced room-temperature ferromagnetism in transparent, conducting anatase Ti1-xTaxO2 (x~0.05) thin films. Philosophical Transactions. Series A Mathematical Physical and Engineering Sciences 370(1977): 4927-4943, 2012

Electrochemically driven, electrode-addressable formation of functionalized polydopamine films for neural interfaces. Angewandte Chemie 51(52): 13101, 2012

Spectroscopic properties of electrochemically populated electronic states in nanostructured TiO2 films: anatase versus rutile. Physical Chemistry Chemical Physics 15(33): 13790, 2013

Low temperature plasma processing for cell growth inspired carbon thin films fabrication. Archives of Biochemistry and Biophysics 605: 41-48, 2016

Single-step direct fabrication of luminescent Cu-doped Zn(x)Cd(1-x)S quantum dot thin films via a molecular precursor solution approach and their application in luminescent, transparent, and conductive thin films. Nanoscale 6(16): 9640-9645, 2014

Controlled in situ fabrication of Ag2O/AgO thin films by a dry chemical route at room temperature for hybrid solar cells. Dalton Transactions 43(29): 11333, 2014

Room temperature fabrication of ZnO nanorod films: synthesis and application as a channel layer of transparent thin film transistors. Chemical Communications: 4545-4547, 2009

Characterization of nanocrystalline anatase TiO(2) thin films. Analytical and Bioanalytical Chemistry 375(7): 917-923, 2003

Fabrication of superhydrophobic three-dimensionally ordered macroporous polytetrafluoroethylene films and its application. Langmuir 30(36): 10804, 2014

Easy fabrication of macroporous gold films using graphene sheets as a template. Acs Applied Materials and Interfaces 5(8): 3481-3486, 2013

Low-Temperature Fabrication of Mesoporous Titanium Dioxide Thin Films with Tunable Refractive Indices for One-Dimensional Photonic Crystals and Sensors on Rigid and Flexible Substrates. Acs Applied Materials and Interfaces 7(24): 13180, 2015

Evolution of nanocrystallinity in periodic mesoporous anatase thin films. Small 1(2): 226-232, 2005

Electrochemically induced sol-gel deposition of zirconia thin films. Chemistry 10(8): 1936-1943, 2004