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Fabrication of hierarchical micro/nanostructures via scanning probe lithography and wet chemical etching



Fabrication of hierarchical micro/nanostructures via scanning probe lithography and wet chemical etching



Ultramicroscopy 108(10): 1205-1209



In this study, we propose a simple and effective method for fabricating hierarchical silicon structures via the combination of scanning probe lithography (SPL) and wet chemical etching. Here, silicon oxide structures were protruded from a <100>-oriented silicon surface, followed by the passivation of silicon nitride by AFM tip-induced local oxidation. Based on the two-dimensional (2D) silicon oxide patterns, three-dimensional (3D) microstructures with high aspect ratios were formed by wet etching with HF and KOH. A variety of combinations of SPL and the etching process allowed us to fabricate diverse silicon-based structures such as deep-etched microstructures and multi-terraced nanostructures.

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Accession: 053182930

Download citation: RISBibTeXText

PMID: 18583055

DOI: 10.1016/j.ultramic.2008.04.076


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