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Single digit nanofabrication by step-and-repeat nanoimprint lithography

Single digit nanofabrication by step-and-repeat nanoimprint lithography

Nanotechnology 23(1): 015305-015305

A novel strategy for fabricating nanoimprint templates with sub-10 nm patterns is demonstrated by combining electron beam lithography and atomic layer deposition. Nanostructures are replicated by step-and-repeat nanoimprint lithography and successfully transferred into functional material with high fidelity. The process extends the capacity of step-and-repeat nanoimprint lithography as a single digit nanofabrication method. Using the ALD process for feature shrinkage, we identify a size dependent deposition rate.

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Accession: 055793690

Download citation: RISBibTeXText

PMID: 22155980

DOI: 10.1088/0957-4484/23/1/015305

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