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Low temperature silicon dioxide film deposition by remote plasma enhanced chemical vapor deposition: growth mechanism

Young-Bae Park; Shi-Woo Rhee

Surface and Coatings Technology 179(2-3): 229-236

2004


ISSN/ISBN: 0257-8972
DOI: 10.1016/s0257-8972(03)00852-1
Accession: 063283750


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