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Preparation of silicon thin films by intense pulsed ion-beam evaporation method with low temperature process



Preparation of silicon thin films by intense pulsed ion-beam evaporation method with low temperature process



Surface and Coatings Technology 201(9-11): 4961-4964




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Accession: 063602531

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DOI: 10.1016/j.surfcoat.2006.07.215


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