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Low-temperature solution-based fabrication of high-k HfO2dielectric thin films via combustion process



Low-temperature solution-based fabrication of high-k HfO2dielectric thin films via combustion process



Journal of Sol-Gel Science and Technology 81(3): 662-668




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Accession: 065014964

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DOI: 10.1007/s10971-016-4231-9


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