Deposition of high-Tc superconducting Y-Ba-Cu-O thin films at low temperatures using a plasma-enhanced organometallic chemical vapor deposition approach
Zhao, J.; Marcy, H.O.; Tonge, L.M.; Wessels, B.W.; Marks, T.J.; Kannewurf, C.R.
Solid State Communications 74(10): 1091-1094
1990
ISSN/ISBN: 0038-1098
Accession: 074757746
PDF emailed within 1 workday: $29.90
Related References
Richeson, D.S.; Tonge, L.M.; Wang, X.K.; Marcy, H.O.; Marks, T.J.; Ketterson, J.B.; Chang, R.P.H.; Kannewurf, C.R. 1989: New hybrid physical vapor deposition/organometallic chemical vapor deposition route to high Tc superconducting Tl-Ba-Ca-Cu-O thin films Applied Physics Letters 55(26): 2778-2780Ai, G.R.; Tao, W.; Li, Y.Q.; Luo, W.M.; Chen, J.B.; Wang, R.; Xie, L.M.; Zhang, X.K.; Huang, J.; Qian, C.T.; Zhou, W.K.; Ye, C.Q.; Ren, J.G. 1989: Preparation of Y-Ba-Cu-O high Tc superconducting thin films by plasma-assisted organometallic chemical vapor deposition Applied Physics Letters 55(2): 194-196
Zhang, J.M.; Marcy, H.O.; Tonge, L.M.; Wessels, B.W.; Marks, T.J.; Kannewurf, C.R. 1989: Organometallic chemical vapor deposition of superconducting, high Tc Pb-doped Bi-Sr-Ca-Cu-O thin films Applied Physics Letters 55(18): 1906-1908
Zhao, J.; Chern, C.S.; Li, Y.Q.; Noh, D.W.; Norris, P.E.; Zawadzki, P.; Kear, B.; Gallois, B. 1990: In-situ growth of YBCO high Tc superconducting thin films by plasma-enhanced metalorganic chemical vapor deposition J. Cryst. Growth 107(1-4): 699-704
Ebihara, K.; Kanazawa, S.; Ikegami, T.; Shiga, M. 1990: Spectroscopic study of plasma-enhanced organometallic chemical vapor deposition for superconducting thin film formation Journal of Applied Physics 68(3): 1151-1156
Zhang, J.M.; Wessels, B.W.; Tonge, L.M.; Marks, T.J. 1990: Formation of oriented high Tc superconducting Bi-Sr-Ca-Cu-O thin films on silver substrastes by organometallic chemical vapor deposition Applied Physics Letters 56(10): 976-978
Chern, C.S.; Zhao, J.; Li, Y.Q.; Kear, N.B.; Gallois, B. 1990: In situ growth of YBa2Cu3O7-x high Tc superconducting thin films directly on sapphire by plasma-enhanced metalorganic chemical vapor deposition Applied Physics Letters 57(7): 721-723
Sugii, N.; Imagawa, K.; Saito, S.; Kanehori, K. 1991: Spectroscopic study on plasma-enhanced chemical vapor deposition of YBa2Cu3Ox superconducting thin films Jpn. J. Appl. Phys 30(1): 48-51
Kanehori, K.; Sugii, N.; Miyauchi, K. 1989: Fabrication of YBa2Cu3O7-x superconducting thin films by organometallic chemical vapor deposition Journal of Solid State Chemistry 82(1): 103-108
Sugii, N.; Kanehori, K.; Miyauchi, K. 1990: Superconducting YBa2Cu3O7-x thin films grown by organometallic chemical vapor deposition International Conference on Solid State Ionics 7 40-41: 819-821
Zhao, J.; Noh, D.W.; Chern, C.; Li, Y.Q.; Norris, P.; Gallois, B.; Kear, B. 1990: Low-temperature in situ formation of Y-Ba-Cu-O hight Tc superconducting thin films by plasma-enhanced metalorganic chemical vapor deposition Applied Physics Letters 56(23): 2342-2344
Zhao, J.; Li, Y.Q.; Chern, C.S.; Norris, P.; Gallois, B.; Kear, B.; Wessels, B.W. 1991: Superconducting YBa2Cu3O7-x thin films on silver substrates by in situ plasma-enhanced metalorganic chemical vapor deposition Applied Physics Letters 58(1): 89-91
Jiming, Z.H.A.N.G.; Jing, Z.H.A.O.; Marcy, H.O.; Tonge, L.M.; Wessels, B.W.; Marks, T.J.; Kannewurf, C.R. 1989: Organometallic chemical vapor deposition of high Tc superconducting Bi-Sr-Ca-Cu-O films Applied Physics Letters 54(12): 1166-1168
Collins, R.W.; Ferlauto, A.S. 2002: Advances in plasma-enhanced chemical vapor deposition of silicon films at low temperatures : Chemical vapour deposition Current Opinion in Solid State and Materials Science 6(5): 425-437
Etspuler, A.; Suhr, H. 1989: Deposition of thin rhodium films by plasma-enhanced chemical vapor deposition Applied Physics A: Materials Science and Processing 48(4): 373-375
Lucovsky, G.; Cheng, W.A.N.G.; Nemanich, R.J.; Williams, M.J. 1991: Deposition of μc-Si and μc-Si-C thin films by remote plasma-enhanced chemical-vapor deposition Sol. Cells 30(1-4): 419-434
Berry, A.D.; Gaskill, D.K.; Holm, R.T.; Cukauskas, E.J.; Kaplan, R.; Henry, R.L. 1988: Formation of high Tc superconducting films by organometallic chemical vapor deposition Applied Physics Letters 52(20): 1743-1745
Richeson, D.S.; Tonge, L.M.; Jing, Z.H.A.O.; Jiming, Z.H.A.N.G.; Marcy, H.O.; Marks, T.J.; Wessels, B.W.; Kannewurf, C.R. 1989: Organometallic chemical vapor deposition routes to high Tc superconducting Tl-Ba-Ca-Cu-O films Applied Physics Letters 54(21): 2154-2156
Reich, S.; Suhr, H.; Hanko, K.; Szepes, L. 1992: Deposition of thin films of zirconium and hafnium boride by plasma enhanced chemical vapor deposition Advanced Materials (Weinheim) 4(10): 650-653
Henley, W.B.; Sacks, G.J. 1997: Deposition of electrochromic tungsten oxide thin films by plasma-enhanced chemical vapor deposition Journal of the Electrochemical Society 144(3): 1045-1050