Diagnostics of plasma for metal-organic chemical vapour deposition of Cu and fabrication of Cu thin films using the plasma
Shiratani, M.; Kawasaki, H.; Fukuzawa, T.; Kinoshita, T.; Watanabe, Y.
Journal of Physics. D, Applied Physics 29(11): 2754-2758
1996
ISSN/ISBN: 0022-3727 Accession: 074848443
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