Electrical, physical, and chemical characteristics of plasma-assisted chemical-vapor deposited semi-insulating a-SiN : H and their use as a resistive field shield for high voltage integrated circuits
Osenbach, J.W.; Zell, J.L.; Knolle, W.R.; Howard, J.J.
Journal of Applied Physics 67(11): 6830-6843
1990
ISSN/ISBN: 0021-8979 Accession: 075154177
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